Paper
3 April 2003 Silicon oxynitride waveguides developed for optomechanical sensing functions
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Abstract
In the last decade, the advances in the MEMS technology lead to the integration of optical structures with MEMS. This association between MEMS technologies and integrated optical structures may provide complex functionality such as sensing, modulation or switching. Optical MEMS integrated on silicon are very attractive in terms of potential for cheap mass production and compatibility with CMOS technologies. In this paper we present the technology of SiON waveguide fabrication including aspects of PECVD and micromachining. PECVD process optimisation in order to increase the waveguide performances is presented. Finally the integrated opto-mechanical sensing structures are discussed.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andrei Sabac, Michal Jozwik, Lukasz Nieradko, and Christophe Gorecki "Silicon oxynitride waveguides developed for optomechanical sensing functions", Proc. SPIE 4944, Integrated Optical Devices: Fabrication and Testing, (3 April 2003); https://doi.org/10.1117/12.468293
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Cited by 2 scholarly publications.
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KEYWORDS
Waveguides

Silicon

Refractive index

Plasma enhanced chemical vapor deposition

Integrated optics

Microelectromechanical systems

Thin films

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