F2-laser micropatterning of chrome-coated CaF2 for vacuum-ultraviolet masks

Andrew Yick; Jianzhao Li; Peter R. Herman

doi:10.1117/12.479538

17 October 2003 F₂-laser micropatterning of chrome-coated CaF₂ for vacuum-ultraviolet masks

Andrew Yick, Jianzhao Li, Peter R. Herman

Proceedings Volume 4977, Photon Processing in Microelectronics and Photonics II; (2003) https://doi.org/10.1117/12.479538
Event: High-Power Lasers and Applications, 2003, San Jose, CA, United States

Abstract

Chrome-on-quartz optics serve multi-functions including high-resolution masks for UV lithography. At the next node down, F₂-laser lithography demands alternate high-transparency substrates such as wide-bandgap CaF₂. We present here a direct-write method of F₂-laser ablation for selective removal of 110-nm thick chrome films on CaF₂ and SiO₂ (fused silica) substrates. Laser-processing parameters are presented for micropatterning of the chrome film with minimal damage to the underlying substrates. Damage thresholds, ablations rates, incubation processes, and surface morphology of the chrome and CaF₂ are described together with methods that reduce ablation debris and collateral damage. Laser-patterned masks are tested in a 157-nm optical projection system at 30-mJ/cm² fluence for sub-micron laser structuring of glass and other materials.

Citation Download Citation

Andrew Yick, Jianzhao Li, and Peter R. Herman "F₂-laser micropatterning of chrome-coated CaF₂ for vacuum-ultraviolet masks", Proc. SPIE 4977, Photon Processing in Microelectronics and Photonics II, (17 October 2003); https://doi.org/10.1117/12.479538

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