Spontaneous UV radiation source based on pulsed discharge in xenon

Mikhail I. Lomaev; D. V. Rybka; Victor F. Tarasenko; A. A. Lisenko

doi:10.1117/12.472850

17 October 2003 Spontaneous UV radiation source based on pulsed discharge in xenon

Mikhail I. Lomaev, D. V. Rybka, Victor F. Tarasenko, A. A. Lisenko

Proceedings Volume 4977, Photon Processing in Microelectronics and Photonics II; (2003) https://doi.org/10.1117/12.472850
Event: High-Power Lasers and Applications, 2003, San Jose, CA, United States

Abstract

Experimental results obtained in study of spontaneous UV radiation source based on high-current pulsed discharge in xenon developed for irradiation of diamond crystal to convert it into conductive state are presented. It is shown that at the pressure of about 450 Torr radiation of Xe lines predominate in UV range of discharge radiation spectrum. The part of radiation energy in the range of 200 - 250 nm with respect to the radiation energy of the whole range recorded (200 - 650 nm) may reach 50%. The maximum density of radiation power was 185 kW/cm². At pressure increasing up to 1200 Torr, the part of thermal radiation increases too. In this case the part of radiation energy in the range of 200 - 250 nm does not exceed 20%.

Citation Download Citation

Mikhail I. Lomaev, D. V. Rybka, Victor F. Tarasenko, and A. A. Lisenko "Spontaneous UV radiation source based on pulsed discharge in xenon", Proc. SPIE 4977, Photon Processing in Microelectronics and Photonics II, (17 October 2003); https://doi.org/10.1117/12.472850

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