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17 October 2003 Surface microfabrication of silica glass by excimer laser irradiation of toluene solution
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Proceedings Volume 4977, Photon Processing in Microelectronics and Photonics II; (2003) https://doi.org/10.1117/12.479420
Event: High-Power Lasers and Applications, 2003, San Jose, CA, United States
Abstract
Laser-induced backside wet etching of silica glass plates was performed by the excitation of a pure toluene solution with a ns-pulsed KrF excimer laser at 248 nm. Well-defined grid micropattern was fabricated without debris and microcrack around the etched area. To understand the etching mechanism, the formation and propagation of shockwave and bubble were monitored by time-resolved optical microscopy at the interface between the silica glass and the toluene solution after laser irradiation. Transient high-pressure as well as high-temperature generated by UV laser irradiation plays a key role in the etching process.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hiroyuki Niino, Yoshimi Yasui, Ximing Ding, Aiko Narazaki, Tadatake Sato, Yoshizo Kawaguchi, and Akira Yabe "Surface microfabrication of silica glass by excimer laser irradiation of toluene solution", Proc. SPIE 4977, Photon Processing in Microelectronics and Photonics II, (17 October 2003); https://doi.org/10.1117/12.479420
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