Process conditions and lithographic performance arch durimide<tm> polyimides in the ultra-thick film regime

Sylvain Irenee Misat; Rudy J. M. Pellens; Rutger Voets; Angelique van Klaveren; Jean-Paul van den Heuvel; L. Peterson; Pamela J. Waterson; D. Racicot; D. Roza

doi:10.1117/12.478241

15 January 2003 Process conditions and lithographic performance of arch durimide polyimides in the ultra-thick film regime

Sylvain Irenee Misat, Rudy J. M. Pellens, Rutger Voets, Angelique van Klaveren, Jean-Paul van den Heuvel, L. Peterson, Pamela J. Waterson, D. Racicot, D. Roza

Author Affiliations +

Proceedings Volume 4979, Micromachining and Microfabrication Process Technology VIII; (2003) https://doi.org/10.1117/12.478241
Event: Micromachining and Microfabrication, 2003, San Jose, CA, United States

Abstract

Paper pending release of an erratum.

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Sylvain Irenee Misat, Rudy J. M. Pellens, Rutger Voets, Angelique van Klaveren, Jean-Paul van den Heuvel, L. Peterson, Pamela J. Waterson, D. Racicot, and D. Roza "Process conditions and lithographic performance of arch durimide polyimides in the ultra-thick film regime", Proc. SPIE 4979, Micromachining and Microfabrication Process Technology VIII, (15 January 2003); https://doi.org/10.1117/12.478241

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