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17 January 2003 Novel fabrication methods for 2D photonic crystals in silicon slab waveguides
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Proceedings Volume 4984, Micromachining Technology for Micro-Optics and Nano-Optics; (2003) https://doi.org/10.1117/12.477850
Event: Micromachining and Microfabrication, 2003, San Jose, CA, United States
Abstract
In this paper we present the development of several new and novel fabrication methods for the realization of two-dimensional photonic crystal devices in silicon slab waveguides. We begin by presenting a process for the fabrication of high fill-factor devices in silicon-on-insulator wafers. Next, we present a grayscale fabrication process for the realization of three-dimensional silicon structures, such as tapered horn couplers. We then present the fabrication of suspended silicon slabs using a co-polymer process based on direct write electron beam lithography and silicon sputtering. And lastly, we conclude by presenting an alternate method for realizing PhC devices in a silicon slab based on a combination of wet and dry etching processes in bulk silicon wafers.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dennis W. Prather, Janusz A. Murakowski, Sriram Venkataraman, Yao Peng, Anita Balcha, Thomas Dillon, and David Pustai "Novel fabrication methods for 2D photonic crystals in silicon slab waveguides", Proc. SPIE 4984, Micromachining Technology for Micro-Optics and Nano-Optics, (17 January 2003); https://doi.org/10.1117/12.477850
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