Lithographic flare measurements of EUV full-field projection optics

Sang Hun Lee; Patrick Naulleau; Christof Krautschik; Manish Chandhok; Henry Chapman; Donna J. O'Connell; Michael Goldstein

doi:10.1117/12.485547

16 June 2003 Lithographic flare measurements of EUV full-field projection optics

Sang Hun Lee, Patrick Naulleau, Christof Krautschik, Manish Chandhok, Henry Chapman, Donna J. O'Connell, Michael Goldstein

Author Affiliations +

Proceedings Volume 5037, Emerging Lithographic Technologies VII; (2003) https://doi.org/10.1117/12.485547
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

We demonstrate direct flare measurements of 4-mirror projection optics in the Engineering Test Stand (ETS) using a conventional resist clearing method (the Kirk method). Two extreme UV lithographic projection optics, one with higher flare than the other, have been characterized and the results compared. The measured results have also been compared to analytical calculations based on measured mirror roughness and the extended point spread function. Full-field flare across the 24 mm field width has been measured, and we have verified that flare is constant across the field for EUV lithography as predicted. Horizontal (H) and vertical (V) flare bias has been observed and the cause of the H-V flare bias has been investigated. The main cause has been identified to be anisotropic mirror polishing. Simulations with the 2D Power Spectral density function have confirmed the experimental results.

Citation Download Citation

Sang Hun Lee, Patrick Naulleau, Christof Krautschik, Manish Chandhok, Henry Chapman, Donna J. O'Connell, and Michael Goldstein "Lithographic flare measurements of EUV full-field projection optics", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); https://doi.org/10.1117/12.485547

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