Optical analysis of mirror-based pattern generation

Yashesh A. Shroff; Yijian Chen; William G. Oldham

doi:10.1117/12.484971

16 June 2003 Optical analysis of mirror-based pattern generation

Yashesh A. Shroff, Yijian Chen, William G. Oldham

Proceedings Volume 5037, Emerging Lithographic Technologies VII; (2003) https://doi.org/10.1117/12.484971
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

We study mirror based pattern generation systems to provide an understanding of how they can be operated in an analog mode to meet the quasi-continuous sizing and placement requirements of optical lithography. Both tilting mirrors and piston-motion mirrors are examined. The aerial images are compared with those generated by simple binary masks. The effect of grayscaling, used to place and size features, on image quality is measured. Normalized image log slope (NILS) is used as the measure of image quality. Tilting mirrors used in grayscale mode provide image quality comparable to binary masks, and piston mirrors are somewhat better.

Citation Download Citation

Yashesh A. Shroff, Yijian Chen, and William G. Oldham "Optical analysis of mirror-based pattern generation", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); https://doi.org/10.1117/12.484971

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