Predicting local thermomechanical distortions of the 200-mm EPL mask system

Po-Tung Lee; Roxann L. Engelstad; Edward G. Lovell; Shintaro Kawata; Noriyuki Hirayanagi; Michael R. Sogard

doi:10.1117/12.504552

16 June 2003 Predicting local thermomechanical distortions of the 200-mm EPL mask system

Po-Tung Lee, Roxann L. Engelstad, Edward G. Lovell, Shintaro Kawata, Noriyuki Hirayanagi, Michael R. Sogard

Proceedings Volume 5037, Emerging Lithographic Technologies VII; (2003) https://doi.org/10.1117/12.504552
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

The timely development of a Next-Generation Lithography depends upon its progress in many technology-dependent areas. Common to all high-throughput systems is the requirement of strict mask distortion control. Thus, in support of the Nikon electron-beam projection lithography tool program, three-dimensional finite element (FE) models have been developed to simulate the transient thermal and structural response of a 200-mm prototype stencil mask during electron beam exposure. Due to the relative size of pattern features, equivalent modeling techniques were employed for computational expedience. Equivalent thermal properties (conductivity and emissivity) have been calculated for perforated membranes as a function of pattern void fraction. Resulting temperature distributions were used as input for the FE structural models to characterize and quantify the local displacement fields. The structural models also utilized equivalent material properties (elastic modulus, shear modulus and Poisson's ratio). Support conditions corresponded to electrostatic chucking with four symmetrically located pad regions. The FE simulations predicted that under typical exposure conditions, the localized thermal distortions within the individual subfields are all less than 1.0 nm, which is well below the allotted error budget.

Citation Download Citation

Po-Tung Lee, Roxann L. Engelstad, Edward G. Lovell, Shintaro Kawata, Noriyuki Hirayanagi, and Michael R. Sogard "Predicting local thermomechanical distortions of the 200-mm EPL mask system", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); https://doi.org/10.1117/12.504552

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available