Spatial emission characteristics of EUV plasma sources

Klaus R. Mann; Sebastian Kranzusch; Christian Peth; Max Christian Schurmann; Thomas Missalla

doi:10.1117/12.482748

16 June 2003 Spatial emission characteristics of EUV plasma sources

Klaus R. Mann, Sebastian Kranzusch, Christian Peth, Max Christian Schurmann, Thomas Missalla

Proceedings Volume 5037, Emerging Lithographic Technologies VII; (2003) https://doi.org/10.1117/12.482748
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

utilizing a laser-based source for the generation of 13nm radiation. The EUV plasma is produced by focusing a Nd:YAG laser into a pulsed xenon or oxygen gas jet. The alternate use of these two target gases accomplishes either an intense broad-band (Xe) or a less intense narrow-band line emission (O2) at 13nm. Different types of nozzles were tested in order to optimize the emitted radiation with respect to maximum EUV intensities, small source dimensions and pulse-to-pulse stabilities. The investigation of these crucial source parameters was performed with specially designed EUV pinhole cameras, utilizing evaluation algorithms developed for standardized laser beam characterization. In addition, a rotatable pinhole camera was developed which allows spatially and angular resolved monitoring of the soft X-ray emission characteristics. With the help of this camera a strong angular dependence of the EUV intensity was found, indicating reabsorption of the EUV radiation in the surrounding gas. The results were compared with Rayleigh scattering measurements for visualization of the target gas density.

Citation Download Citation

Klaus R. Mann, Sebastian Kranzusch, Christian Peth, Max Christian Schurmann, and Thomas Missalla "Spatial emission characteristics of EUV plasma sources", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); https://doi.org/10.1117/12.482748

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