Cr and MoSi photomask plasma etching

Banqiu Wu; David Y. Chan

doi:10.1117/12.483666

2 June 2003 Cr and MoSi photomask plasma etching

Banqiu Wu, David Y. Chan

Proceedings Volume 5038, Metrology, Inspection, and Process Control for Microlithography XVII; (2003) https://doi.org/10.1117/12.483666
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

The Advanced Metrology Advisory Group (AMAG) is a council composed of the chief CD-metrologists from the International SEMATECH consortium's Member Companies and from the National Institute of Standards (NIST). The AMAG wrote, in 2002, with CD-SEM supplier involvement, updated the 'Unified Advanced CD-SEM Specification for Sub-130nm Technology (version 2002)' to be a living document which outlines the required performance of advanced CD-SEMs for supplier compliance to the 2001 International Technology Roadmap for Semiconductors, and also conveys other member companies' collective needs to vendors. Using this specification, a benchmarking effort of the currently available advanced CD-SEMs will be performed. As these results are not yet complete, they will be presented at a future date. However, the current version of the specification has undergone many changes and improvements from the last, and these will be discussed here.

Citation Download Citation

Banqiu Wu and David Y. Chan "Cr and MoSi photomask plasma etching", Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); https://doi.org/10.1117/12.483666

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