Demonstration of imaging interferometric microscopy (IIM)

Christian J. Schwarz; Yuliya Kuznetsova; Steven R. J. Brueck

doi:10.1117/12.483429

2 June 2003 Demonstration of imaging interferometric microscopy (IIM)

Christian J. Schwarz, Yuliya Kuznetsova, Steven R. J. Brueck

Proceedings Volume 5038, Metrology, Inspection, and Process Control for Microlithography XVII; (2003) https://doi.org/10.1117/12.483429
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

We demonstrate imaging interferometric microscopy (IIM) for binary objects in two dimensions. Combining multiple exposures with different off-axis illumination configurations together with interferometric restoration of the zero-order beam during dark-field conditions, IIM provides high lateral resolution at low numerical apertures (NA). It retains the large field-of-view, long working distance and large depth-of-field of a low-NA imaging system. Also we include a first demonstration of imaging of a phase mask. All these properties are increasingly important for in semiconductor mask metrology. IIM relies on image processing to reconstruct the image; we present the processes necessary to obtain the combined image. Finally we compare the experiment with a simple Fourier optics model.

Citation Download Citation

Christian J. Schwarz, Yuliya Kuznetsova, and Steven R. J. Brueck "Demonstration of imaging interferometric microscopy (IIM)", Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); https://doi.org/10.1117/12.483429

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KEYWORDS

Spatial frequencies

Interferometry

Microscopes

Microscopy

Photomasks

Imaging systems

Image processing

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