Optical digital profilometry applications on contact holes

Joerg Bischoff; Xinhui Niu; Nickhil H. Jakatdar

doi:10.1117/12.483686

2 June 2003 Optical digital profilometry applications on contact holes

Joerg Bischoff, Xinhui Niu, Nickhil H. Jakatdar

Proceedings Volume 5038, Metrology, Inspection, and Process Control for Microlithography XVII; (2003) https://doi.org/10.1117/12.483686
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

Optical scatterometry and Optical Digital Profiling (ODP) have become mainstram technology in CD and profile metrology. Without question, the extension of these techniques to measure 3D patterns such as contact holes or posts is an important demand. In this paper, we demonstrate the application of ODP to contact holes and posts for both lithography and etch processes. The underlying theory based onthe Rigorous Coupled Wave Approach is outlined and metrology results are compared with simulations.

Citation Download Citation

Joerg Bischoff, Xinhui Niu, and Nickhil H. Jakatdar "Optical digital profilometry applications on contact holes", Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); https://doi.org/10.1117/12.483686

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