Quantifying drift in SEM

Albert Sicignano; Dmitriy Y. Yeremin; Matthew Sandy; E. Tim Goldburt

doi:10.1117/12.482833

2 June 2003 Quantifying drift in SEM

Albert Sicignano, Dmitriy Y. Yeremin, Matthew Sandy, E. Tim Goldburt

Proceedings Volume 5038, Metrology, Inspection, and Process Control for Microlithography XVII; (2003) https://doi.org/10.1117/12.482833
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

A novel approach for determining the drift behavior of an SEM with high precision in 2D space is presented. David Joy described an indirect proceudre for qualitatively detecting image drift in the time domain using FFTs of sequential images. SEM metrology is based on first acquiring an image representation of an object. In this paper, we present a direct approach for quantifying SEM image drift. The next step is applying various algorithms which attempt to determine feature boundaries. The above sequence is based on a stable SEM performance during teh image acquisition interval. If movement of the feature within the imaged field occurs during the acquisition interval, a distorted stability is a critical precursor for precision SEM metrology. We will describe a novel approach for quantifying SEM drift with a precision greeater than 0.2nm within an image field.

Citation Download Citation

Albert Sicignano, Dmitriy Y. Yeremin, Matthew Sandy, and E. Tim Goldburt "Quantifying drift in SEM", Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); https://doi.org/10.1117/12.482833

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