Fluorinated materials for 157-nm lithography

Andrew Poss; David Nalewajek; Hari Nair

doi:10.1117/12.485088

12 June 2003 Fluorinated materials for 157-nm lithography

Andrew Poss, David Nalewajek, Hari Nair

Proceedings Volume 5039, Advances in Resist Technology and Processing XX; (2003) https://doi.org/10.1117/12.485088
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

Theoretical absorption spectra at 157 nm for a variety of fluorinated norbornene monomers were calculated by time dependent-density functional theory (TD.DFT). Based on the theoretical spectra, we have prepared a number of fluorinated norbornene monomers via different synthetic routes. Norbornene based fluorinated monomers were readily prepared from commercially available starting materials in good yields.

Citation Download Citation

Andrew Poss, David Nalewajek, and Hari Nair "Fluorinated materials for 157-nm lithography", Proc. SPIE 5039, Advances in Resist Technology and Processing XX, (12 June 2003); https://doi.org/10.1117/12.485088

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