Imaging and photochemistry studies of fluoropolymers for 193-nm lithography

Will Conley; Paul Zimmerman; Daniel Miller; Guen Su Lee

doi:10.1117/12.485204

12 June 2003 Imaging and photochemistry studies of fluoropolymers for 193-nm lithography

Will Conley, Paul Zimmerman, Daniel Miller, Guen Su Lee

Proceedings Volume 5039, Advances in Resist Technology and Processing XX; (2003) https://doi.org/10.1117/12.485204
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

The authors have studied the impact of absorbance on the overall process window. The chemical contrast has been monitored by FTIR to understand the overall effect of absorbance through careful modulation of absorbing additives 193nm. The effects of absorbance and contrast has been simulated and through experimentation confirmed. The authors will provide comprehensive details of the synthesis of polymers, additives and impact on 157nm lithography.

Citation Download Citation

Will Conley, Paul Zimmerman, Daniel Miller, and Guen Su Lee "Imaging and photochemistry studies of fluoropolymers for 193-nm lithography", Proc. SPIE 5039, Advances in Resist Technology and Processing XX, (12 June 2003); https://doi.org/10.1117/12.485204

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