New trilayer resist process using a phenol-capped siloxane-based middle-layer for ArF resist process

Akihiko Otoguro; Satoshi Takechi; Takatoshi Deguchi; Isamu Hanyu

doi:10.1117/12.485062

12 June 2003 New trilayer resist process using a phenol-capped siloxane-based middle-layer for ArF resist process

Akihiko Otoguro, Satoshi Takechi, Takatoshi Deguchi, Isamu Hanyu

Author Affiliations +

Proceedings Volume 5039, Advances in Resist Technology and Processing XX; (2003) https://doi.org/10.1117/12.485062
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

We have developed a new tri-layer resist process to meet requirements related to etching durability and aspect ratio of ArF process. The new phenol capped siloxane-based middle-layer does not change thickness and does not increase particles even after six months. Additionally no footing pattern formation occurs. Our middle-layer has a function as anti-reflect and simulated reflectivity in a top ArF resist layer is less than 1.0% at the tri-layer structure by controlling middle-layer and under-layer thickness. The critical dimension (CD) uniformity of 140 nm contact hole pattern is less than 6 nm (3 sigma) intra wafer. This new middle layer gives high etching sensitivity relative to under-layer and we can demonstrate pattern transfer using a contact hole pattern. We have applied this system to a dual damascene process and successfully completed a 280-nm pitch multilevel copper interconnection. We conclude that our new tri-layer resist process is suitable for use in mass production of 90-nm node LSI and below.

Citation Download Citation

Akihiko Otoguro, Satoshi Takechi, Takatoshi Deguchi, and Isamu Hanyu "New trilayer resist process using a phenol-capped siloxane-based middle-layer for ArF resist process", Proc. SPIE 5039, Advances in Resist Technology and Processing XX, (12 June 2003); https://doi.org/10.1117/12.485062

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE