Synthesis of norbornene copolymers with diazo groups and their application as DUV resists

Jin-Baek Kim; Kyoung Seon Kim

doi:10.1117/12.485104

12 June 2003 Synthesis of norbornene copolymers with diazo groups and their application as DUV resists

Jin-Baek Kim, Kyoung Seon Kim

Proceedings Volume 5039, Advances in Resist Technology and Processing XX; (2003) https://doi.org/10.1117/12.485104
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

We synthesized a new type of norbornene-maleic anhydride copolymer which as diazoketo groups instead of acid labile protecting groups. The matrix polymer does not need a photoacid generator for the lithographic evaluation. And there is no necessity for the post-exposure bake step that is the cause of PED effects. Methyl 5-norbornenyl-3-oxopropionate was prepared by the reaction of acetyl norbornene with dimethyl carbonate in the presence of sodium hydride. And methyl 5-norbornenyl-2-diazo-3-oxopropionate was synthesized from the reaction between methyl 5-norbornenyl-3-oxopropionate and p-carboxybenzenesulfonyl azide. The polymer was prepared by free radical polymerization. Upon exposure to DUV light, diazoketo groups undergo a series of reactions that culminate in the formation of a carboxylic acid. The matrix polymer in the exposed region becomes soluble in the aqueous base developer. The polymer showed bleaching effect after exposure. Thermal stability of the polymer is measured by TGA and DSC. Characterization of the polymer is achieved using other techniques such as FT-IR, NMR, GPC, and UV. The resist patterns of 0.6 μm feature size were resolved using a KrF exposure tool and with a conventional developer, 2.38 wt% TMAH aqueous solution.

Citation Download Citation

Jin-Baek Kim and Kyoung Seon Kim "Synthesis of norbornene copolymers with diazo groups and their application as DUV resists", Proc. SPIE 5039, Advances in Resist Technology and Processing XX, (12 June 2003); https://doi.org/10.1117/12.485104

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