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26 June 2003 Application-specific methods for creating simulation masks
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Abstract
Lithography simulation is being used in a wide range of applications to help lithographers solve an equally wide range of problems. A necessary input to optical lithography simulation is the specification of the mask transmittance function, m(x,y), which forms the basis for the aerial image calculation. Various methods are used to specify m(x,y). The choice of method depends, in part, on the capabilities of the simulation software package and the available information. To maximize effectiveness, efficiency and accuracy, users should choose a method of specifying m(x,y) which considers the requirements of their application. In many cases, a simple expression for m(x,y) is all that is needed. In other cases, finer detail is desirable or even necessary. This paper reviews many techniques to generate m(x,y) for the PROLITH family of lithography simulators and presents current research for the defect printability application.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
William B. Howard and Darren Taylor "Application-specific methods for creating simulation masks", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); https://doi.org/10.1117/12.485536
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