Domain decomposition methods for simulation of printing and inspection of phase defects

Michael Lam; Konstantinos Adam; Andrew R. Neureuther

doi:10.1117/12.485485

26 June 2003 Domain decomposition methods for simulation of printing and inspection of phase defects

Michael Lam, Konstantinos Adam, Andrew R. Neureuther

Proceedings Volume 5040, Optical Microlithography XVI; (2003) https://doi.org/10.1117/12.485485
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

A detailed study of the domain decomposition method by edges (edge-DDM) is used to show the smallest feature sizes that can be accurately simulated using the decomposition, and thereby understand the domain of applicability for this simulation method during printing. For features in arbitrary layouts, edge-DDM is accurate to better than 1% for any mask lateral feature dimension of 2l or longer. The smallest feature dimension could be even smaller, depending on the types of edges present in the layout. Design graphs are produced to show the smallest feature dimension for any specific layout. In general, the TE polarization limits the edge-DDM applicability, and extensions to model the boundary interactions at small CDs may be able to reduce the smallest feature dimension to equal that of the TM polarization, resulting in a 1 - 1.5 λ minimum dimension. A 'defect projector' method for rapidly and accurately simulating defect printability is introduced and combined with edge-DDM. Calculations of the CD change from the defect projector method agree with calculations of CD change from rigorous simulations with embedded defects to within 30%, despite low NILS values from the test structure used in this study. Finally, the impacts on edge-DDM accuracy for both off-axis illumination and the larger numerical apertures utilized during inspection are investigated. Results show that high spatial frequency errors resulting from edge-DDM synthesis of the near fields are problematic for inspection. Asymptotic anticipation is suggested for modeling the high frequency components.

Citation Download Citation

Michael Lam, Konstantinos Adam, and Andrew R. Neureuther "Domain decomposition methods for simulation of printing and inspection of phase defects", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); https://doi.org/10.1117/12.485485

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