Optimal model-predictive control of overlay lithography implemented in an ASIC fab

Scott A. Middlebrooks

doi:10.1117/12.485303

1 July 2003 Optimal model-predictive control of overlay lithography implemented in an ASIC fab

Scott A. Middlebrooks

Proceedings Volume 5044, Advanced Process Control and Automation; (2003) https://doi.org/10.1117/12.485303
Event: Advanced Microelectronic Manufacturing, 2003, Santa Clara, CA, United States

Abstract

This work integrates fundamental models and metrology sensors with state-of-the-art estimation and model-predictive control techniques in order to regulate overlay photo-lithography errors. Fundamental overlay models are presented that describe the relationship between the photo-lithography steppers and the metrology sensors. A Kalman Filter is employed that utilizes the process model and the sensor model and automatically estimates uncertain states given metrology measurements. A model-predictive controller is employed that is very effective in rejecting disturbances in the overlay process, such as tool drift and model mismatch. All overlay errors have been driven to zero +/- the measurement variance of the metrology tool. This level of control is achieved for every tool-device-layer-reticle combination.

Citation Download Citation

Scott A. Middlebrooks "Optimal model-predictive control of overlay lithography implemented in an ASIC fab", Proc. SPIE 5044, Advanced Process Control and Automation, (1 July 2003); https://doi.org/10.1117/12.485303

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