Paper
26 December 1984 Computer Simulation Of Thin Film Growth: Applying The Results To Optical Coatings
M. Sikkens, I. J. Hodgkinson, F. Horowitz, H. A. Macleod, J. J. Wharton
Author Affiliations +
Abstract
Computer simulation of thin film growth has been used extensively to gain insight into the origin and nature of the microstructure of vapor deposited thin films. Usually, however, no attempts are made to predict film properties other than column angle and film density from such simulations. The aim of our work is to derive quantitative data from computer simulations in order to be able to predict relevant properties of optical coatings. The deposition of 2,500 - 25,000 particles has been simulated on different computers by random deposition of two-dimensional hard disks, using a simple relaxation scheme. Statistical analysis of the results yields quantitative data for the density, column angle and column period. On the basis of these results, a simple model has been developed for the microstruc-ture of a three-dimensional film. The birefringence and the shape of water penetration fronts in evaporated optical coatings, predicted from this model, are confirmed by experiment.
© (1984) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M. Sikkens, I. J. Hodgkinson, F. Horowitz, H. A. Macleod, and J. J. Wharton "Computer Simulation Of Thin Film Growth: Applying The Results To Optical Coatings", Proc. SPIE 0505, Advances in Optical Materials, (26 December 1984); https://doi.org/10.1117/12.964652
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Cited by 2 scholarly publications.
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KEYWORDS
Particles

Computer simulations

Thin films

Optical coatings

3D modeling

Birefringence

Statistical analysis

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