EUV emission of solid targets irradiated by femto- and picosecond laser pulses

Georg Soumagne; Tamotsu Abe; Kenichi Ikeda; Hiroshi Komori; Hiroshi Someya; Takashi Suganuma; Kazuhisa Nakajima; Akira Endo

doi:10.1117/12.541149

18 November 2003 EUV emission of solid targets irradiated by femto- and picosecond laser pulses

Georg Soumagne, Tamotsu Abe, Kenichi Ikeda, Hiroshi Komori, Hiroshi Someya, Takashi Suganuma, Kazuhisa Nakajima, Akira Endo

Author Affiliations +

Proceedings Volume 5063, Fourth International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.541149
Event: Fourth International Symposium on Laser Precision Microfabrication, 2003, Munich, Germany

Abstract

Various solid materials have been irradiated with laser intensities ranging from 10¹¹ to 10¹⁶ W/cm² and the plasma emission has been measured between 7 nm and 18 nm. A chirped pulse amplified Ti:Sapphire laser oscillating at 790 nm with either 100 fs or 300 ps pulse duration and a Nd:YAG laser oscillating at 1064 nm with 10 ns pulse duration (fwhm) have been used. Tin, aluminum and copper have been chosen as targets. It has been found that the plasma emission was strongest for the 300 ps laser pulse irradiation. This might be due to the additional laser plasma heating during plasma formation.

Citation Download Citation

Georg Soumagne, Tamotsu Abe, Kenichi Ikeda, Hiroshi Komori, Hiroshi Someya, Takashi Suganuma, Kazuhisa Nakajima, and Akira Endo "EUV emission of solid targets irradiated by femto- and picosecond laser pulses", Proc. SPIE 5063, Fourth International Symposium on Laser Precision Microfabrication, (18 November 2003); https://doi.org/10.1117/12.541149

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