Paper
12 May 2003 Comparison of low-frequency noise in III-V and Si/SiGe HBTs
Fabien Pascal, Sylvie Guenard-Jarrix, Colette Delseny, Annick Penarier, Cyril Chay, M. Jamal Deen
Author Affiliations +
Proceedings Volume 5113, Noise in Devices and Circuits; (2003) https://doi.org/10.1117/12.488966
Event: SPIE's First International Symposium on Fluctuations and Noise, 2003, Santa Fe, New Mexico, United States
Abstract
The low frequency noise characteristics of double self-aligned InP/InGaAs and two types Si/SiGe heterojunction bipolar transistors (HBTs) were investigated. Spectral analysis shows no striking differences; the spectra are composed of a 1/f component and the white noise is always reached at low bias. A general trend for all the transistors was the presence of Lorentzian(s) component(s) for the smallest devices. The voltage coherence function was always one for SiGe transistors; and for the first time, it was found to be close to zero for InP devices. Concerning the 1/f noise level, both types of transistors have approximately a quadratic dependence on base current bias and an inverse dependence on the emitter area. Thus a comparison of the 1/f noise level has been made using the Kb parameter, and values around 109 μm2 for SiGe HBTs and around 108 μm2 for InP HBTs were found. These results are of same order of magnitude as the best published ones. The low frequency noise results suggest that excess noise sources are mainly located at the intrinsic emitter-base junction for the two type of SiGe devices, and for the for InP HBTs, a correlated noise source is located at the emitter periphery. To compare different devices and technologies, fc/fT where fT is the unity current gain frequency was studied as a function of collector current density and for some HBT technologies, fc/fT α Jc. The effects of different processing conditions, designs and temperature were also investigated and will be discussed.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Fabien Pascal, Sylvie Guenard-Jarrix, Colette Delseny, Annick Penarier, Cyril Chay, and M. Jamal Deen "Comparison of low-frequency noise in III-V and Si/SiGe HBTs", Proc. SPIE 5113, Noise in Devices and Circuits, (12 May 2003); https://doi.org/10.1117/12.488966
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Cited by 4 scholarly publications.
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KEYWORDS
Transistors

Silicon

Surface plasmons

Silicon carbide

Germanium

Oxides

Resistance

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