CONFERENCE PROCEEDINGS
Advanced Search
Home > Proceedings > Volume 5130 > Article
Paper
28 August 2003 Advanced FIB mask repair technology for 100-nm/ArF lithography: II
Ryoji Hagiwara, Anto Yasaka, Kazuo Aita, Osamu Takaoka, Yoshihiro Koyama, Tomokazu Kozakai, Toshio Doi, Masashi Muramatsu, Katsumi Suzuki, Yasuhiko Sugiyama, Osamu Matsuda, Mamoru Okabe, Shoji Shinohara, Masakatsu Hasuda, Tatsuya Adachi, Yasutaka Morikawa, Masaharu Nishiguchi, Yasushi Sato, Naoya Hayashi, Toshiya Ozawa, Yoshihiro Tanaka, Nobuyuki Yoshioka
Author Affiliations +
Proceedings Volume 5130, Photomask and Next-Generation Lithography Mask Technology X; (2003) https://doi.org/10.1117/12.504212
Event: Photomask and Next Generation Lithography Mask Technology X, 2003, Yokohama, Japan
Abstract
Photomask is a key factor to support the lithography technology. Defect repairing technology has become more important than ever to keeping the photomasks' integrity in the manufacturing processes. The SIR5000 is a photomask defect repair system for ArF/90 nm generation lithography. In this work, the repaired masks by the SIR5000 were evaluated by an Aerial Imaging Microscope System (AIMS) and Atomic Force Microscope (AFM). These test results do not show actual printing condition on wafer, but rather a simulated lithography image. In this paper, we present the imaging damage, the edge placement repeatability, the repair area's transmission and the printing performance on wafer. An ArF scanner was employed for the tests on the imaging damage and the printing performance. The transmission of imaged area is more than 95% after 70 scanning frames. The edge placement has shown the 90 nm node repair capability. The transmission of repaired area is no issue by AIMS193 analysis. The actual printing result on wafer has shown there is no printing issue. The SIR5000 is well suited for ArF generation lithography.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation Download Citation
Ryoji Hagiwara, Anto Yasaka, Kazuo Aita, Osamu Takaoka, Yoshihiro Koyama, Tomokazu Kozakai, Toshio Doi, Masashi Muramatsu, Katsumi Suzuki, Yasuhiko Sugiyama, Osamu Matsuda, Mamoru Okabe, Shoji Shinohara, Masakatsu Hasuda, Tatsuya Adachi, Yasutaka Morikawa, Masaharu Nishiguchi, Yasushi Sato, Naoya Hayashi, Toshiya Ozawa, Yoshihiro Tanaka, and Nobuyuki Yoshioka "Advanced FIB mask repair technology for 100-nm/ArF lithography: II", Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); https://doi.org/10.1117/12.504212
ACCESS THE FULL ARTICLE
ORGANIZATIONAL
Sign in with credentials provided by your organization.
INSTITUTIONAL
Select your institution to access the SPIE Digital Library.
SELECT YOUR INSTITUTION
PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
PERSONAL SIGN IN
No SPIE Account? Create one
PURCHASE THIS CONTENT
SUBSCRIBE TO DIGITAL LIBRARY
50 downloads per 1-year subscription
Members: $195
Non-members: $335 ADD TO CART
25 downloads per 1 - year subscription
Members: $145
Non-members: $250 ADD TO CART
PURCHASE SINGLE ARTICLE
Includes PDF, HTML & Video, when available
Members: $17.00
Non-members: $21.00 ADD TO CART
PROCEEDINGS
 10 PAGES
DOWNLOAD PAPER SAVE TO MY LIBRARY
GET CITATION
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Printing
Photomasks
Binary data
Lithography
Semiconducting wafers
Imaging systems
Ions
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top