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28 August 2003 Aerial-image based inspection of AAPSM for 193-nm lithography generation
Anja Rosenbusch, Shirley Hemar, Reuven Falah
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Proceedings Volume 5130, Photomask and Next-Generation Lithography Mask Technology X; (2003) https://doi.org/10.1117/12.504060
Event: Photomask and Next Generation Lithography Mask Technology X, 2003, Yokohama, Japan
Abstract
The inspection of alternating phase shifting masks is still one of the major challenges in state-of-the-art mask making. Main issue is that phase defects cannot easily be identified by inspection systems using an inspection wavelength different form the target exposure wavelength. The paper presents inspection results using the Aera193, an aerial image based mask inspection system.
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Anja Rosenbusch, Shirley Hemar, and Reuven Falah "Aerial-image based inspection of AAPSM for 193-nm lithography generation", Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); https://doi.org/10.1117/12.504060
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KEYWORDS
Heads up displays
Inspection
Lithography
Photomasks
Mask making
Phase shifting
System identification
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