Translator Disclaimer
Paper
28 August 2003 Application results achieved with LINUX cluster for data preparation
Author Affiliations +
Proceedings Volume 5130, Photomask and Next-Generation Lithography Mask Technology X; (2003) https://doi.org/10.1117/12.504219
Event: Photomask and Next Generation Lithography Mask Technology X, 2003, Yokohama, Japan
Abstract
The ever growing layout complexity and escalating data volumes to be handled in high-end mask making processes using variable-shaped beam writers (VSB) require totally new computing and software solutions for data preparation. The high-performance, cost-effective LINUX Cluster is the ideal tool to manage these challenging tasks and, in addition, offers the advantage of being upgradable and expandable for meeting future lithography requirements. In this paper different computer configurations are analyzed. As a logical consequence the data conversion issue, including Proximity Effect Correction, of VSB e-beam systems and their specific data formats are also reflected in this investigation. Distributed and multi-threading computing is compared highlighting the advantages of the distributed approach.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Juergen Gramss, Melchior Lemke, Hans Eichhorn, Voler Neick, Michael Kramer, and Erhard Stache "Application results achieved with LINUX cluster for data preparation", Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); https://doi.org/10.1117/12.504219
PROCEEDINGS
9 PAGES


SHARE
Advertisement
Advertisement
Back to Top