Mask technologies for metastable atom lithography: photomask and physical mask

Xin Ju; Mitsunori Kurahashi; Taku Suzuki; Yasushi Yamauchi

doi:10.1117/12.507555

28 August 2003 Mask technologies for metastable atom lithography: photomask and physical mask

Xin Ju, Mitsunori Kurahashi, Taku Suzuki, Yasushi Yamauchi

Proceedings Volume 5130, Photomask and Next-Generation Lithography Mask Technology X; (2003) https://doi.org/10.1117/12.507555
Event: Photomask and Next Generation Lithography Mask Technology X, 2003, Yokohama, Japan

Abstract

Using TEM copper grid with different pitch size as physical mask, alkanethiolates self-assembled monolayers was patterned by a metastable helium atom beam, demonstrating pattern transfer with nanoscale edge width to the underlying gold film. We found that the mask was reproduced as positive- or negative patterns with high fidelity, and the repetition of lithographic patterns was good in different runs.

Citation Download Citation

Xin Ju, Mitsunori Kurahashi, Taku Suzuki, and Yasushi Yamauchi "Mask technologies for metastable atom lithography: photomask and physical mask", Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); https://doi.org/10.1117/12.507555

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