Reticle inspection using an image filter method

Tomoyuki Okada; Masahiko Minemura; Kazuhiko Takahashi; Mitsuo Sakurai; Satoshi Akutagawa

doi:10.1117/12.504203

28 August 2003 Reticle inspection using an image filter method

Tomoyuki Okada, Masahiko Minemura, Kazuhiko Takahashi, Mitsuo Sakurai, Satoshi Akutagawa

Proceedings Volume 5130, Photomask and Next-Generation Lithography Mask Technology X; (2003) https://doi.org/10.1117/12.504203
Event: Photomask and Next Generation Lithography Mask Technology X, 2003, Yokohama, Japan

Abstract

This paper reports a technique of reticle inspection incorporating the use of an image filter. In this technique, optical intensity distribution is calculated by optical simulation of electron beam lithography (EB) data or an image file obtained from a SEM photograph to evaluate the printability of defects on a reticle. When an image file is compared with the EB data, the image file has differences at the rounded corners as well as at the areas with defects because the image file is obtained from the reticle pattern. To reduce the differences, an image filter (or reticle filter), which simulates the pattern creation process on a reticle, was applied to the EB data. The simulated EB data is defined as the non-defect reference pattern. The optical intensity and critical dimension (CD) were then obtained. Image files of defects were obtained from the SEM photographs of reticle patterns having various sizes of defects. By applying optical simulation to patterns obtained from the image files, the optical intensity and CD were calculated and compared with those of the reference pattern, and the differences are evaluated. The evaluation results showed that optical intensity and CD changes fluctuate regardless of the size or type of defect. Correlation was confirmed between the differences in optical intensity and the CD changes in the defect area. It was thus concluded that defect printability can be evaluated by the differences in optical intensity obtained from image files.

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Tomoyuki Okada, Masahiko Minemura, Kazuhiko Takahashi, Mitsuo Sakurai, and Satoshi Akutagawa "Reticle inspection using an image filter method", Proc. SPIE 5130, Photomask and Next-Generation Lithography Mask Technology X, (28 August 2003); https://doi.org/10.1117/12.504203

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KEYWORDS

Image filtering

Reticles

Scanning electron microscopy

Critical dimension metrology

Optical simulations

Optical filters

Photography

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