Laser-assisted microstructuring for Ti:sapphire channel-waveguide fabrication

A. Crunteanu; Markus Pollnau; G. Janchen; C. Hibert; Patrik Hoffmann; Rene-Paul Salathe; Robert William Eason; David P. Shepherd

doi:10.1117/12.543706

14 November 2003 Laser-assisted microstructuring for Ti:sapphire channel-waveguide fabrication

A. Crunteanu, Markus Pollnau, G. Janchen, C. Hibert, Patrik Hoffmann, Rene-Paul Salathe, Robert William Eason, David P. Shepherd

Author Affiliations +

Proceedings Volume 5147, ALT'02 International Conference on Advanced Laser Technologies; (2003) https://doi.org/10.1117/12.543706
Event: ALT'02 International Conference on Advanced laser Technologies, 2002, Adelboden, Switzerland

Abstract

We report on the fabrication of Ti:sapphire channel waveguides. Such channel waveguides are of interest, e.g., as low-threshold tunable lasers. We investigated several structuring methods including ion beam implantation followed by wet chemical etching strip loading by polyimide spin coating and subsequent laser micro-machining, direct laser ablation or reactive ion etching through laser-structured polyimide contact masks. The later two methods result in ribs having different widths and heights up to ~5 μm. By reactive ion etching we have obtained channel waveguides with strong confinement of the Ti:sapphire fluorescence emission.

Citation Download Citation

A. Crunteanu, Markus Pollnau, G. Janchen, C. Hibert, Patrik Hoffmann, Rene-Paul Salathe, Robert William Eason, and David P. Shepherd "Laser-assisted microstructuring for Ti:sapphire channel-waveguide fabrication", Proc. SPIE 5147, ALT'02 International Conference on Advanced Laser Technologies, (14 November 2003); https://doi.org/10.1117/12.543706

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