Development and characterization of new CD mask standards: a status report

Thomas Schatz; Bertram Hauffe; Stefan Dobereiner; Hans-Jurgen Bruck; Bernd Brendel; Lutz Bettin; Klaus-Dieter Roth; Walter Steinberg; Peter Speckbacher; Wolfgang Sedlmeier; Thomas Engel; Wolfgang Hassler-Grohne; Werner Mirande; Harald Bosse

doi:10.1117/12.514952

28 May 2003 Development and characterization of new CD mask standards: a status report

Thomas Schatz, Bertram Hauffe, Stefan Dobereiner, Hans-Jurgen Bruck, Bernd Brendel, Lutz Bettin, Klaus-Dieter Roth, Walter Steinberg, Peter Speckbacher, Wolfgang Sedlmeier, Thomas Engel, Wolfgang Hassler-Grohne, Werner Mirande, Harald Bosse

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Proceedings Volume 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2003) https://doi.org/10.1117/12.514952
Event: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 2003, Sonthofen, Germany

Abstract

We report on the current status of a project on development and characterization of CD photomasks with 6025 format to be used as reference standards for different type of CD metrology instruments. The project consortium consists of mask suppliers, manufacturers of CD metrology instruments, users of such instruments and calibration laboratories. Different type of CD metrology instrumentation, namely optical CD microscopes, CD-SEM, and AFM will be applied for investigation and measurement of microstructures, additionally supported by AIMS tool. We will describe the basic design criteria of the mask standard and first measurement results gained with different metrology tools on the prototype mask standards.

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Thomas Schatz, Bertram Hauffe, Stefan Dobereiner, Hans-Jurgen Bruck, Bernd Brendel, Lutz Bettin, Klaus-Dieter Roth, Walter Steinberg, Peter Speckbacher, Wolfgang Sedlmeier, Thomas Engel, Wolfgang Hassler-Grohne, Werner Mirande, and Harald Bosse "Development and characterization of new CD mask standards: a status report", Proc. SPIE 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (28 May 2003); https://doi.org/10.1117/12.514952

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KEYWORDS

Photomasks

Prototyping

Metrology

Standards development

Atomic force microscopy

Calibration

Line edge roughness

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