Through the looking glass: what is on the horizon for the mask maker?

R. Scott Mackay; Benjamin George Eynon Jr.; Dhirendra P. Mathur

doi:10.1117/12.514946

28 May 2003 Through the looking glass: what is on the horizon for the mask maker?

R. Scott Mackay, Benjamin George Eynon Jr., Dhirendra P. Mathur

Proceedings Volume 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2003) https://doi.org/10.1117/12.514946
Event: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 2003, Sonthofen, Germany

Abstract

The future of mask industry technology is in flux. While the requirements for current and near-term lithographic capability is well understood, advanced lithography options pose a completely new set of challenges to the mask maker. Challenges are not only process and materials related, but also include more fundamental concerns dealing with how to afford the necessary capability development. This paper identifies the issues and attempts to propose solutions to the industry's growing concerns.

Citation Download Citation

R. Scott Mackay, Benjamin George Eynon Jr., and Dhirendra P. Mathur "Through the looking glass: what is on the horizon for the mask maker?", Proc. SPIE 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (28 May 2003); https://doi.org/10.1117/12.514946

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