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31 December 2003 Characterization of thin films nonuniform in optical parameters by spectroscopic digital reflectometry
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Abstract
In this paper, a new optical method for characterizing nonuniform thin films is employed. For applying this method the special experimental arrangement containing CCD camera as a detector is used. Using this experimental arrangement the spectral dependencies of the local reflectances are obtained. After treating these experimental data of the distributions of the values of the local thicknesses and local refractive index along a large areas of the substrates of the nonuniform films are found. Moreover, it is shown that this method can be used to determine strong nonuniformities in both the optical parameters. The method is illustrated through the optical characterization of a nonuniform ZnSe epitaxial thin film deposited onto gallium arsenide single-crystal substrate and nonuniform film formed by the mixture of CNx and SiOy deposited onto silicon single-crystal substrate.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ivan Ohlidal, Miloslav Ohlidal, Petr Klapetek, Vladimir Cudek, and Milos Jakl "Characterization of thin films nonuniform in optical parameters by spectroscopic digital reflectometry", Proc. SPIE 5182, Wave-Optical Systems Engineering II, (31 December 2003); https://doi.org/10.1117/12.509628
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