Accuracy of optical thin film parameter determination based on spectrophotometric data

Alexander V Tikhonravov; Michael K. Trubetskov; Gary W. DeBell

doi:10.1117/12.505499

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4 November 2003 On the accuracy of optical thin film parameter determination based on spectrophotometric data

Alexander V Tikhonravov, Michael K. Trubetskov, Gary W. DeBell

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Proceedings Volume 5188, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies; (2003) https://doi.org/10.1117/12.505499
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

Adequate modeling of high quality non-absorbing dielectric thin films requires the inclusion of the degree of bulk inhomogeneity as one of the parameters in the model describing the film. We show that in the case of a satisfactory choice of a thin film model, the main source of errors in the computed optical parameters of high quality films are systematic errors in spectrophotometric data. Based on practical examples and theoretical predictions we estimate that an accuracy of 0.5% in the determination of optical parameters of dielectric thin films should be considered as a good result when viewed in the context of the current state of the art in optical characterization based on spectrophotometric data. A level of accuracy significantly better than this would require an extraordinary effort.

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Alexander V Tikhonravov, Michael K. Trubetskov, and Gary W. DeBell "On the accuracy of optical thin film parameter determination based on spectrophotometric data", Proc. SPIE 5188, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies, (4 November 2003); https://doi.org/10.1117/12.505499

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