Comparison of roughness measurement with atomic force microscopy and interference microscopy

Anders Kuhle; Bengt-Goran Rosen; Joergen Garnaes

doi:10.1117/12.521309

4 November 2003 Comparison of roughness measurement with atomic force microscopy and interference microscopy

Anders Kuhle, Bengt-Goran Rosen, Joergen Garnaes

Proceedings Volume 5188, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies; (2003) https://doi.org/10.1117/12.521309
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

Atomic force microscopy (AFM) and interference microscopy are two methods often used to measure roughness, but the probe size is very different and they respond to different physical properties (hardness and reflectivity). In earlier work we have shown that the limited resolution of interference microscopy can be approximated by the longwave components of a Gaussian filtering of the AFM image with a cut-off wavelength λ_c a little larger than the wavelength of light. This description was valid for smooth and hard surfaces with good reflectivity such as polished metal surfaces (R_q < 10 nm). In this paper we extent the analysis to directly measure the effective cut-off wavelength λ_c = 2600 nm for a particular interference microscope based on the profiles of grooves with a period of 3000 nm, a depth of (104 ± 1) nm and vertical sidewalls. To validate the measured parameter λ_c, the same area on a polished hip joint prosthesis was measured by both an AFM and the particular interference microscope. Without a Gaussian filtering of the AFM image the appearance and calculated roughness of the images were significantly different (R_a= 1.7 nm, R_q = 2.2 nm versus R_a = 1.0 nm, R_q = 1.2 nm). However, using the measured cut-off wavelength the visual appearance of the longwave components of the AFM image and the interference microscope image are almost identical and the calculated roughness is equal. This strongly suggests that an effective cut-off wavelength can be measured and used to give consistency between the different methods in the range where they overlap.

Citation Download Citation

Anders Kuhle, Bengt-Goran Rosen, and Joergen Garnaes "Comparison of roughness measurement with atomic force microscopy and interference microscopy", Proc. SPIE 5188, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies, (4 November 2003); https://doi.org/10.1117/12.521309

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