Equal optical path beam splitters by use of amplitude-splitting and wavefront-splitting methods for pencil beam interferometer

Shinan Qian; Peter Z. Takacs

doi:10.1117/12.508024

13 January 2004 Equal optical path beam splitters by use of amplitude-splitting and wavefront-splitting methods for pencil beam interferometer

Shinan Qian, Peter Z. Takacs

Author Affiliations +

Proceedings Volume 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications; (2004) https://doi.org/10.1117/12.508024
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

A beam splitter to create two separated parallel beams is a critical unit of a pencil beam interferometer, for example the long trace profiler (LTP). The operating principle of the beam splitter can be based upon eitehr amplitude-splitting (AS) or wavefront-splitting (WS). For precision measurements with the LTP, an equal optical path system with two parallel beams is desired. Frequency drift of the light source in a non-equal optical path system will cause the interference fringes to drift. An equal optical path prism beam splitter with an amplitude-splitting (AS-EBS) beam splitter and a phase shift beam splitter with a wavefront-splitting (WS-PSBS) are introduced. These beam splitters are well suited to the stability requirement for a pencil beam interferometer due to the characteristics of monolithic structure and equal optical path. Several techniques to produce WS-PSBS by hand are presented. In addition, the WS-PSBS using double thin plates, made from microscope cover plates, has great advantages of economy, convenience, availability, and ease of adjustment over other beam splitting methods. Comparison of stability measurements made with the AS-EBS, WS-PSBS, and other beam splitters is presented.

Citation Download Citation

Shinan Qian and Peter Z. Takacs "Equal optical path beam splitters by use of amplitude-splitting and wavefront-splitting methods for pencil beam interferometer", Proc. SPIE 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications, (13 January 2004); https://doi.org/10.1117/12.508024

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