Paper
23 December 2003 Focusing properties of silicon refractive lenses: comparison of experimental results with the computer simulation
Irina Snigireva, Vecheslav Yunkin, Sergey Kuznetsov, Maxim Grigoriev, Marina Chukalina, Leonid Shabel'nikov, Anatoly A. Snigirev, Martin Hoffmann, Edgar Voges
Author Affiliations +
Abstract
Focusing properties of Si planar refractive lenses including experimental tests and theoretical analysis have been studied. Computer simulations of the X-ray wave field distribution near the focal plane have been performed for different lens designs. Comparison of the experimental results with the computer simulation allows establishing the reasons for deviation of focusing from ideal performance. The deviation of the lens vertical sidewall profile was minimized by additional correction in the lens design and special efforts in optimization of etching process. Optimized lenses were manufactured, tested at the ESRF and brought out the dramatic enhancement in focusing properties.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Irina Snigireva, Vecheslav Yunkin, Sergey Kuznetsov, Maxim Grigoriev, Marina Chukalina, Leonid Shabel'nikov, Anatoly A. Snigirev, Martin Hoffmann, and Edgar Voges "Focusing properties of silicon refractive lenses: comparison of experimental results with the computer simulation", Proc. SPIE 5195, Crystals, Multilayers, and Other Synchrotron Optics, (23 December 2003); https://doi.org/10.1117/12.507070
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Cited by 3 scholarly publications.
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KEYWORDS
Lenses

Silicon

Etching

Lens design

X-rays

Computer simulations

Photomasks

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