High-efficiency tin-based EUV sources

Martin C. Richardson; Chiew-Seng Koay; Christian K. Keyser; Kazutoshi Takenoshita; Etsuo Fujiwara; Moza M. Al-Rabban

doi:10.1117/12.514083

7 January 2004 High-efficiency tin-based EUV sources

Martin C. Richardson, Chiew-Seng Koay, Christian K. Keyser, Kazutoshi Takenoshita, Etsuo Fujiwara, Moza M. Al-Rabban

Proceedings Volume 5196, Laser-Generated and Other Laboratory X-Ray and EUV Sources, Optics, and Applications; (2004) https://doi.org/10.1117/12.514083
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

We have previously proposed the use of mass-limited, tin-containing laser plasma sources for EUV lithography applications. Here we report advances in measurements of the spectral output, conversion efficiency, and debris emission from these sources. We also report progress in the use of repeller field debris inhibition techniques for this source.

Citation Download Citation

Martin C. Richardson, Chiew-Seng Koay, Christian K. Keyser, Kazutoshi Takenoshita, Etsuo Fujiwara, and Moza M. Al-Rabban "High-efficiency tin-based EUV sources", Proc. SPIE 5196, Laser-Generated and Other Laboratory X-Ray and EUV Sources, Optics, and Applications, (7 January 2004); https://doi.org/10.1117/12.514083

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