Multi-keV picosecond x-ray source development from ultra-intense kHz laser-cluster interaction

Fabien Dorchies; Frederic Blasco; Christophe Bonte; Tony Caillaud; Jean-Claude Gauthier; Christian Stenz; Jorgen Stevefelt

doi:10.1117/12.507998

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7 January 2004 Multi-keV picosecond x-ray source development from ultra-intense kHz laser-cluster interaction

Fabien Dorchies, Frederic Blasco, Christophe Bonte, Tony Caillaud, Jean-Claude Gauthier, Christian Stenz, Jorgen Stevefelt

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Proceedings Volume 5196, Laser-Generated and Other Laboratory X-Ray and EUV Sources, Optics, and Applications; (2004) https://doi.org/10.1117/12.507998
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

Multi-keV X-ray source from intense laser-cluster interaction was experimentally studied. A special effort was first made in order to characterize the cluster target. K-shell emission of Argon clusters (around 3 keV) was then studied when irradiated by kHz, 30 fs, 10¹⁷ W.cm^-2 laser pulses. High-resolution spectra are presented, in this spectral range, as a function of laser duration and average cluster size. Signature of very highly charged ions (Ar¹⁶⁺) was observed with relatively low intensity laser pulses (few 10¹⁵ W.cm^-2). This feature is not yet clearly understood nor reproduced by simulations. Optimal laser pulse duration was observed for X-ray production, depending on the cluster size. For the first time to our knowledge, the duration of K-shell X-ray bursts was measured with a home-made streak camera to be on the picosecond scale.

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Fabien Dorchies, Frederic Blasco, Christophe Bonte, Tony Caillaud, Jean-Claude Gauthier, Christian Stenz, and Jorgen Stevefelt "Multi-keV picosecond x-ray source development from ultra-intense kHz laser-cluster interaction", Proc. SPIE 5196, Laser-Generated and Other Laboratory X-Ray and EUV Sources, Optics, and Applications, (7 January 2004); https://doi.org/10.1117/12.507998

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