Thin films of In2O3/SiO as optical gamma radiation sensors

Khalil Arshak; Olga Korostynska; John Henry

doi:10.1117/12.505238

20 January 2004 Thin films of In₂O₃/SiO as optical gamma radiation sensors

Khalil Arshak, Olga Korostynska, John Henry

Proceedings Volume 5198, Hard X-Ray and Gamma-Ray Detector Physics V; (2004) https://doi.org/10.1117/12.505238
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

This paper explores the use of mixed oxide materials such as In₂O₃ and SiO with various compositions in the form of thermally deposited thin films for gamma radiation dosimetry application. 137Cs radiation source with an activity of 370 kBq was used for exposing the samples to γ-radiation. The absorption spectra for as-deposited and γ-irradiated films were recorded using CARY 1E UV-Visible Spectrophotometer. The values of the optical band gap E_opt were obtained in the view of the Mott and Davis’ theory. It was found that the optical properties of thin films were highly affected by composition and manufacturing conditions. For comparison, E_opt of as-deposited thin film with composition 75 wt.% of In2O3 and 25 wt.% of SiO was found to be 0.9 eV, whereas films with 50 wt.% of In2O3 and 50 wt.% of SiO have E_opt=1.15 eV, in all cases assuming indirect allowed transition. It was noted that E_opt decreased with the increase in radiation dose, i.e. the overall disorder of the system has increased. Thin films of In₂O₃ and SiO mixtures might be regarded as a cost-effective alternative to the existing commercially available radiation detectors.

Citation Download Citation

Khalil Arshak, Olga Korostynska, and John Henry "Thin films of In₂O₃/SiO as optical gamma radiation sensors", Proc. SPIE 5198, Hard X-Ray and Gamma-Ray Detector Physics V, (20 January 2004); https://doi.org/10.1117/12.505238

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