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3 November 2003 Near-field multiphoton nanolithography using an apertureless optical probe
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Abstract
Near-field multiphoton optical lithography is demonstrated by using ~120 fs laser pulses at 790 nm in an apertureless near-field optical microscope, which produce the lithographic features with ~ 70 nm resolution. The technique takes advantage of the field enhancement at the extremity of a metallic probe to induce nanoscale multiphoton absorption and polymerization in a commercial photoresist, SU-8. Even without optimization of the resist or laser pulses, the spatial resolution of this technique is as high as λ/10, nearly a factor of two smaller than the previous multiphoton lithography in the far field.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xiaobo Yin, Nicholas Fang, Xiang Zhang, Ignacio B. Martini, and Benjamin J. Schwartz "Near-field multiphoton nanolithography using an apertureless optical probe", Proc. SPIE 5211, Nonlinear Optical Transmission and Multiphoton Processes in Organics, (3 November 2003); https://doi.org/10.1117/12.510920
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