Translator Disclaimer
15 October 2003 A raster multibeam lithography tool for sub-100-nm mask fabrication utilizing a novel photocathode
Author Affiliations +
A raster multibeam lithography tool is in Etec’s roadmap to meet the stringent requirements of sub 100 nm mask fabrication. The tool leverages the long experience obtained with the ALTA laser pattern generators and the high resolution capabilities of e-beam lithography. A photocathode controlled by acousto-optic modulated 257nm laser beams is utilized to generate 32 electron beams. The beams are accelerated at 50 KV in an electron column, demagnified and focussed on the mask or wafer substrate. The performance of the photocathode and other system components will be presented together with preliminary lithographic patterning.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Juan R Maldonado, Steven T. Coyle, Bassam Shamoun, Ming Yu, Timothy N. Thomas, Douglas E. Holmgren, Xiaolan Chen, B. DeVore, M. R. Scheinfein, and Mark A. Gesley "A raster multibeam lithography tool for sub-100-nm mask fabrication utilizing a novel photocathode", Proc. SPIE 5220, Nanofabrication Technologies, (15 October 2003);


Electron beam throughput from raster to imaging
Proceedings of SPIE (December 22 2016)
Advanced e-beam systems for manufacturing
Proceedings of SPIE (July 09 1992)
PML2 the maskless multibeam solution for the 22nm node...
Proceedings of SPIE (March 18 2009)
An Economic View Of Electron Beam Lithography
Proceedings of SPIE (August 08 1977)
MAGIC a European program to push the insertion of...
Proceedings of SPIE (March 28 2008)

Back to Top