A raster multibeam lithography tool for sub-100-nm mask fabrication utilizing a novel photocathode

Juan R Maldonado; Steven T. Coyle; Bassam Shamoun; Ming Yu; Timothy N. Thomas; Douglas E. Holmgren; Xiaolan Chen; B. DeVore; M. R. Scheinfein; Mark A. Gesley

doi:10.1117/12.512863

Translator Disclaimer

15 October 2003 A raster multibeam lithography tool for sub-100-nm mask fabrication utilizing a novel photocathode

Juan R Maldonado, Steven T. Coyle, Bassam Shamoun, Ming Yu, Timothy N. Thomas, Douglas E. Holmgren, Xiaolan Chen, B. DeVore, M. R. Scheinfein, Mark A. Gesley

Author Affiliations +

Proceedings Volume 5220, Nanofabrication Technologies; (2003) https://doi.org/10.1117/12.512863
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

A raster multibeam lithography tool is in Etec’s roadmap to meet the stringent requirements of sub 100 nm mask fabrication. The tool leverages the long experience obtained with the ALTA laser pattern generators and the high resolution capabilities of e-beam lithography. A photocathode controlled by acousto-optic modulated 257nm laser beams is utilized to generate 32 electron beams. The beams are accelerated at 50 KV in an electron column, demagnified and focussed on the mask or wafer substrate. The performance of the photocathode and other system components will be presented together with preliminary lithographic patterning.

Citation Download Citation

Juan R Maldonado, Steven T. Coyle, Bassam Shamoun, Ming Yu, Timothy N. Thomas, Douglas E. Holmgren, Xiaolan Chen, B. DeVore, M. R. Scheinfein, and Mark A. Gesley "A raster multibeam lithography tool for sub-100-nm mask fabrication utilizing a novel photocathode", Proc. SPIE 5220, Nanofabrication Technologies, (15 October 2003); https://doi.org/10.1117/12.512863

ACCESS THE FULL ARTICLE