Paper
25 February 2004 Design and fabrication of biperiodic AR gratings for the infrared
Ludovic Escoubas, Michele Loli, Jean-Jacques Simon, Hugues Giovannini, Francois Flory, Frederic Lemarquis, Stefan Enoch, Gerard Berginc
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Abstract
We have designed and fabricated a silicon grating which shows antireflection properties in the [4μm ; 6 μm] spectral region. It is shown both theoretically and experimentally that, even if the refractive index and the grating period are in the extend that a simple homogenization theory can not be used, a substantial broadband antireflection effect can be obtained. The grating was made using a wet anisotropic etching technique. The reflectance was calculated with a modal method and compared successfully with the experimental results. It is shown that the grating reduces the silicon substrate reflectance in the whole [4 μm ; 6 μm] spectral domain by a factor greater than 10.
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Ludovic Escoubas, Michele Loli, Jean-Jacques Simon, Hugues Giovannini, Francois Flory, Frederic Lemarquis, Stefan Enoch, and Gerard Berginc "Design and fabrication of biperiodic AR gratings for the infrared", Proc. SPIE 5250, Advances in Optical Thin Films, (25 February 2004); https://doi.org/10.1117/12.512709
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KEYWORDS
Silicon

Reflectivity

Etching

Antireflective coatings

Optical design

Photoresist materials

Coating

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