Manufacturing of four-quadrant phase mask for nulling interferometry in the thermal infrared

Frederic Lemarquis; Michel Lequime; Gerard Albrand; Ludovic Escoubas; Jean-Jacques Simon; Jacques Baudrand; Pierre Riaud; Daniel Rouan; Anthony Boccaletti; Pierre Baudoz; Dimitri Mawet

doi:10.1117/12.513386

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25 February 2004 Manufacturing of four-quadrant phase mask for nulling interferometry in the thermal infrared

Frederic Lemarquis, Michel Lequime, Gerard Albrand, Ludovic Escoubas, Jean-Jacques Simon, Jacques Baudrand, Pierre Riaud, Daniel Rouan, Anthony Boccaletti, Pierre Baudoz, Dimitri Mawet

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Proceedings Volume 5250, Advances in Optical Thin Films; (2004) https://doi.org/10.1117/12.513386
Event: Optical Systems Design, 2003, St. Etienne, France

Abstract

The Four Quadrant Phase Mask is a key component for the design of advanced coronagraphs that may be used to search exo-planets. The validity of this concept has been demonstrated in the visible and need now to be demonstrated in the mid infrared. For this purpose, two components are manufactured for wavelengths 4.75 and 16.25 μm. This manufacturing requires the deposition of ZnSe layers using Ion Assisted Deposition, followed by a lift off process.

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Frederic Lemarquis, Michel Lequime, Gerard Albrand, Ludovic Escoubas, Jean-Jacques Simon, Jacques Baudrand, Pierre Riaud, Daniel Rouan, Anthony Boccaletti, Pierre Baudoz, and Dimitri Mawet "Manufacturing of four-quadrant phase mask for nulling interferometry in the thermal infrared", Proc. SPIE 5250, Advances in Optical Thin Films, (25 February 2004); https://doi.org/10.1117/12.513386

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