Optical metrology of thin films using high-accuracy spectrophotometric measurements with oblique angles of incidence

Saulius Nevas; Farshid Manoocheri; Erkki Ikonen; Alexander V. Tikhonravov; Michail A. Kokarev; Michail K. Trubetskov

doi:10.1117/12.512700

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25 February 2004 Optical metrology of thin films using high-accuracy spectrophotometric measurements with oblique angles of incidence

Saulius Nevas, Farshid Manoocheri, Erkki Ikonen, Alexander V. Tikhonravov, Michail A. Kokarev, Michail K. Trubetskov

Author Affiliations +

Proceedings Volume 5250, Advances in Optical Thin Films; (2004) https://doi.org/10.1117/12.512700
Event: Optical Systems Design, 2003, St. Etienne, France

Abstract

Oblique-incidence spectrophotometric measurements are considered for reliable determination of the refractive index and thickness of thin-film coatings. By using a model of the spectral transmittance of thin film samples, the effect of systematic factors on the determined thin-film parameters is analyzed. The optical parameters of a silicon-dioxide sample determined from the experimental results obtained with the HUT spectrophotometer are consistent for the incidence angles between 0 and 56.4 degrees, demonstrating high accuracy of film-parameter determination.

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Saulius Nevas, Farshid Manoocheri, Erkki Ikonen, Alexander V. Tikhonravov, Michail A. Kokarev, and Michail K. Trubetskov "Optical metrology of thin films using high-accuracy spectrophotometric measurements with oblique angles of incidence", Proc. SPIE 5250, Advances in Optical Thin Films, (25 February 2004); https://doi.org/10.1117/12.512700

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