Effects of reticle reflectance on lithography

Kevin D. Cummings; Bernd Geh; Bing Lu; James R. Wasson; Eric Weisbrod; William J. Dauksher; Kevin J. Nordquist; Pawitter Mangat

doi:10.1117/12.516925

17 December 2003 Effects of reticle reflectance on lithography

Kevin D. Cummings, Bernd Geh, Bing Lu, James R. Wasson, Eric Weisbrod, William J. Dauksher, Kevin J. Nordquist, Pawitter Mangat

Author Affiliations +

Proceedings Volume 5256, 23rd Annual BACUS Symposium on Photomask Technology; (2003) https://doi.org/10.1117/12.516925
Event: Photomask Technology, 2003, Monterey, California, United States

Abstract

We report in this work experimental and theoretical results showing the effects of absorber reflectivity on standard flare measurements, image formation and how this may contribute to various image metrics used in lithography. Our study shows that under typical conditions the reflectance from the absorber film has only a small effect on the image produced by the exposure system.

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Kevin D. Cummings, Bernd Geh, Bing Lu, James R. Wasson, Eric Weisbrod, William J. Dauksher, Kevin J. Nordquist, and Pawitter Mangat "Effects of reticle reflectance on lithography", Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); https://doi.org/10.1117/12.516925

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