Fourier optic imaging equations for the immersion case

Peter D. Brooker

doi:10.1117/12.518884

17 December 2003 Fourier optic imaging equations for the immersion case

Peter D. Brooker

Proceedings Volume 5256, 23rd Annual BACUS Symposium on Photomask Technology; (2003) https://doi.org/10.1117/12.518884
Event: Photomask Technology, 2003, Monterey, California, United States

Abstract

The purpose of this paper is to extend the Fourier optic imaging equations to the case of immersion lithography. Specifically, the paper will derive the equation describing the complex amplitude at the wafer plane for both the immersion case and the non immersion case. By comparing the two equations, a parameter transformation will be explicitly derived that allows the equation for the non immersion case to describe the immersion case. With these transformations, lithography simulators such as SOLID-C can be used to accurately model immersion lithography.

Citation Download Citation

Peter D. Brooker "Fourier optic imaging equations for the immersion case", Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); https://doi.org/10.1117/12.518884

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KEYWORDS

Refraction

Liquids

Fourier optics

Semiconducting wafers

Reticles

Immersion lithography

Lithography

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