Influence of antireflection coatings in ArF lithography

Bruno M. La Fontaine; Adam Richard Pawloski; Alden Acheta; Yunfei Deng; Harry J. Levinson; Christopher Spence; Christian Chovino; Laurent Dieu; Eric Johnstone; Franklin Kalk

doi:10.1117/12.518220

17 December 2003 Influence of antireflection coatings in ArF lithography

Bruno M. La Fontaine, Adam Richard Pawloski, Alden Acheta, Yunfei Deng, Harry J. Levinson, Christopher Spence, Christian Chovino, Laurent Dieu, Eric Johnstone, Franklin Kalk

Author Affiliations +

Proceedings Volume 5256, 23rd Annual BACUS Symposium on Photomask Technology; (2003) https://doi.org/10.1117/12.518220
Event: Photomask Technology, 2003, Monterey, California, United States

Abstract

The impact of wafer and reticle anti-reflection coatings (ARCs) on the aerial image of ArF lithography scanners is measured using contrast curves and critical dimension (CD) analysis. The importance of a good ARC layer on the wafer appears to be greater than that of the reticle-ARC. In fact, for state-of-the-art lithography scanners, the influence of the reticle-ARC is practically undetectable. Numerical simulations are used to understand the relative contributions of the lens, the wafer and the reticle to the overall loss of contrast associated with non-optimized ARCs.

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Bruno M. La Fontaine, Adam Richard Pawloski, Alden Acheta, Yunfei Deng, Harry J. Levinson, Christopher Spence, Christian Chovino, Laurent Dieu, Eric Johnstone, and Franklin Kalk "Influence of antireflection coatings in ArF lithography", Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); https://doi.org/10.1117/12.518220

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