Toward large-area simulation of e-beam lithography

Martin Bohn; Ulrich Hofmann; Wolfgang Hoppe; Christopher J. Progler; Michael Ryzhoukhin

doi:10.1117/12.520812

17 December 2003 Toward large-area simulation of e-beam lithography

Martin Bohn, Ulrich Hofmann, Wolfgang Hoppe, Christopher J. Progler, Michael Ryzhoukhin

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Proceedings Volume 5256, 23rd Annual BACUS Symposium on Photomask Technology; (2003) https://doi.org/10.1117/12.520812
Event: Photomask Technology, 2003, Monterey, California, United States

Abstract

As in optical lithography, E-beam lithography is facing a multitude of issues, both in mask making and in direct write applications. These issues range from pattern printability and design verifications to tool and process optimizations. Simulation can be used to address these issues, however its applicability was limited due to limitations in the usable simulation area. Advances in the mathematical models lead to a significant speedup of the simulation, enabling the simulation of larger areas. This paper will demonstrate the applicability of the new simulator on a few key examples, such as aggressive mask challenges, model to experiment correlations as well as its application to direct write.

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Martin Bohn, Ulrich Hofmann, Wolfgang Hoppe, Christopher J. Progler, and Michael Ryzhoukhin "Toward large-area simulation of e-beam lithography", Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); https://doi.org/10.1117/12.520812

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