Si3N4: manufacture and characterization of optical waveguides

Aurelio H. Heredia-Jimenez; Miguel A. Basurto-Pensado; Romeo J. Selvas; Jesus Escobedo-Alatorre; R. J. Romero-Dominguez; R. Tecuatl-Q

doi:10.1117/12.543449

15 December 2003 Si₃N₄: manufacture and characterization of optical waveguides

Aurelio H. Heredia-Jimenez, Miguel A. Basurto-Pensado, Romeo J. Selvas, Jesus Escobedo-Alatorre, R. J. Romero-Dominguez, R. Tecuatl-Q

Author Affiliations +

Proceedings Volume 5260, Applications of Photonic Technology 6; (2003) https://doi.org/10.1117/12.543449
Event: Applications of Photonic Technology, 2003, Quebec City, Québec, Canada

Abstract

In this work, the deposit technique of amorphous films for production of optical waveguides is presented, as well as the characterization of these waveguides. The basic theory is also presented for propagation of light in waveguides.

Citation Download Citation

Aurelio H. Heredia-Jimenez, Miguel A. Basurto-Pensado, Romeo J. Selvas, Jesus Escobedo-Alatorre, R. J. Romero-Dominguez, and R. Tecuatl-Q "Si₃N₄: manufacture and characterization of optical waveguides", Proc. SPIE 5260, Applications of Photonic Technology 6, (15 December 2003); https://doi.org/10.1117/12.543449

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